Peek, Benjamin and Chalker, Paul (2025) SSAT_Influence_of_Aluminium_Incorporation_140825. [Data Collection]
Data Catalogue DOI: 10.17638/datacat.liverpool.ac.uk/3044
Description
Data set supporting paper
| Keywords: | Aluminium, Aluminium doping, Atomic Layer deposition, Low energy ion scattering, P-type oxide semiconductor, SnO, Tin monoxide |
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| Date Deposited: | 07 Oct 2025 09:08 |
| Last Modified: | 07 Oct 2025 09:10 |
| DOI: | 10.17638/datacat.liverpool.ac.uk/3044 |
| URI: | https://datacat.liverpool.ac.uk/id/eprint/3044 |
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