Barrier tuning of atomic layer deposited Ta2O5 and Al2O3 in double dielectric diodes, Journal of Vacuum Science and Technology B, 35(1) 01A117 (2017)

Mitrovic, Ivona Z (2017) Barrier tuning of atomic layer deposited Ta2O5 and Al2O3 in double dielectric diodes, Journal of Vacuum Science and Technology B, 35(1) 01A117 (2017). [Data Collection]

Data Catalogue DOI: 10.17638/datacat.liverpool.ac.uk/268

Description

The data set relates to the article with DOI: 10.1116/1.4974219.

Keywords: Ta2O5, Al2O3, metal insulator metal didoes
Divisions: Faculty of Science and Engineering > School of Electrical Engineering, Electronics and Computer Science
Depositing User: Ivona Mitrovic
Date Deposited: 16 Mar 2017 10:24
Last Modified: 16 Mar 2017 10:25
DOI: 10.17638/datacat.liverpool.ac.uk/268
URI: https://datacat.liverpool.ac.uk/id/eprint/268

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Data

Figures data% ... T B-2017.xlsx
+ Figures data% ... T B-2017.xlsx
Creative Commons: Attribution 4.0

Read me

Readme-Noureddi ... T B-2017.docx
+ Readme-Noureddi ... T B-2017.docx
Creative Commons: Attribution 4.0

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