Self limiting atomic layer deposition of conformal nano-structured silver films

Potter, Richard, Golrokhi, Zahra, Chalker, Sophia and Sutcliffe, Chris (2015) Self limiting atomic layer deposition of conformal nano-structured silver films. [Data Collection]

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The controlled deposition of ultra-thin conformal silver nanoparticle films is of interest for applications including anti-microbial surfaces, plasmonics, catalysts and sensors. While numerous techniques can produce silver nanoparticles, few are able to produce highly conformal coatings on high aspect ratio surfaces, together with sub-nanometre control and scalability. Here we develop a self-limiting atomic layer deposition (ALD) process for the deposition of conformal metallic silver nanoparticle films. The films have been deposited using direct liquid injection ALD with ((hexafluoroacetylacetonato) silver (I) (1,5-cyclooctadiene)) and propan-1-ol. An ALD temperature window between 123 and 128 °C is identified and within this range self-limiting growth is confirmed with a mass deposition rate of ~17.5 ng per cm2 per cycle. The effects of temperature, precursor dose, co-reactant dose and cycle number on the deposition rate and on the properties of the films have been systematically investigated. Under self-limiting conditions, films are metallic silver with a nano-textured surface topography and nanoparticle size is dependent on the number of ALD cycles. The ALD reaction mechanisms have been elucidated using in-situ quartz crystal microbalance (QCM) measurements, showing chemisorption of the silver precursor, followed by heterogeneous catalytic dehydrogenation of the alcohol to form metallic silver and an aldehyde.

Keywords: Atomic layer deposition, ALD, Silver, nanoparticles
Divisions: Faculty of Science and Engineering > School of Engineering
Depositing User: Richard Potter
Date Deposited: 16 Dec 2015 11:11
Last Modified: 16 Dec 2015 12:12
URI: http://datacat.liverpool.ac.uk/id/eprint/78

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